Potrebujeme váš súhlas na využitie jednotlivých dát, aby sa vám okrem iného mohli ukazovať informácie týkajúce sa vašich záujmov. Súhlas udelíte kliknutím na tlačidlo „OK“.
Standard Practice for Scanning Electron Microscope Beam Size Characterization
NORMA vydaná dňa 1.6.2017
Označenie normy: ASTM E986-04(2017)
Poznámka: NEPLATNÁ
Dátum vydania normy: 1.6.2017
Kód tovaru: NS-685453
Počet strán: 3
Približná hmotnosť: 9 g (0.02 libier)
Krajina: Americká technická norma
Kategória: Technické normy ASTM
Keywords:
electron beam size, E766, graphite fiber, magnification, NIST-SRM 2069B, resolution, SEM, SEM performance, spot size, waveform ,, ICS Number Code 31.120 (Electronic display devices),37.020 (Optical equipment)
Significance and Use | ||||
4.1 The traditional resolution test of the SEM requires, as a first step, a photomicrograph of a fine particulate sample taken at a high magnification. The operator is required to measure a distance on the photomicrograph between two adjacent, but separate edges. These edges are usually less than one millimetre apart. Their image quality is often less than optimum limited by the S/N ratio of a beam with such a small diameter and low current. Operator judgment is dependent on the individual acuity of the person making the measurement and can vary significantly. 4.2 Use of this practice results in SEM electron beam size characterization which is significantly more reproducible than the traditional resolution test using a fine particulate sample. |
||||
1. Scope | ||||
1.1 This practice provides a reproducible means by which one aspect of the performance of a scanning electron microscope (SEM) may be characterized. The resolution of an SEM depends on many factors, some of which are electron beam voltage and current, lens aberrations, contrast in the specimen, and operator-instrument-material interaction. However, the resolution for any set of conditions is limited by the size of the electron beam. This size can be quantified through the measurement of an effective apparent edge sharpness for a number of materials, two of which are suggested. This practice requires an SEM with the capability to perform line-scan traces, for example, Y-deflection waveform generation, for the suggested materials. The range of SEM magnification at which this practice is of utility is from 1000 to 50 000 × . Higher magnifications may be attempted, but difficulty in making precise measurements can be expected. 1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. 1.3 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee. |
||||
2. Referenced Documents | ||||
|
Chcete mať istotu, že používate len platné technické normy?
Ponúkame Vám riešenie, ktoré Vám zaistí mesačný prehľad o aktuálnosti noriem, ktoré používate.
Chcete vedieť viac informácií ? Pozrite sa na túto stránku.
Posledná aktualizácia: 2024-12-22 (Počet položiek: 2 217 000)
© Copyright 2024 NORMSERVIS s.r.o.