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ASTM D5127-13(2018)
Standard Guide for Ultra-Pure Water Used in the Electronics and Semiconductor Industries
NORMA vydaná dňa 15.10.2018
Informácie o norme:
Označenie normy: ASTM D5127-13(2018)
Dátum vydania normy: 15.10.2018
Kód tovaru: NS-904616
Počet strán: 6
Približná hmotnosť: 18 g (0.04 libier)
Krajina: Americká technická norma
Kategória: Technické normy ASTM
Kategórie - podobné normy:
Voda pro průmyslové účely
Ostatní výrobky chemického průmyslu
Anotácia textu normy ASTM D5127-13(2018) :
Keywords:
electronic, microelectronics, semiconductor, ultra-pure water,, ICS Number Code 13.060.25 (Water for industrial use), 71.100.99 (Other products of the chemical industry)
Doplňujúce informácie
| Significance and Use | ||||||||||||||||||||||||||||||||||||||||
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4.1 This guide recommends the water quality required for the electronics and microelectronics industries. High-purity water is required to prevent contamination of products during manufacture, since contamination can lead to an unacceptable, low yield of electronic devices. 4.2 The range of water purity is defined in accordance with the manufacturing process. The types of ultra-pure water are defined with respect to device line width. In all cases, the water-quality recommendations apply at the point of distribution. 4.3 The limits on the impurities are related to current contamination specifications and to available analytical methods (either performed in a suitable clean laboratory or by on-line instrumentation). On-line and off-line methods are used in accordance with current industry practice. Concentration of the sample may be required to measure the impurities at the levels indicated in Table 1. All
values are equal to or less than with the exception of
Resistivity.
1.1 This guide provides recommendations
for water quality related to electronics and semiconductor-industry
manufacturing. Seven classifications of water are described,
including water for line widths as low as 0.032 μm. In all cases,
the recommendations are for water at the point of distribution
(POD).
1.2 Water is used for washing and rinsing of semiconductor components during manufacture. Water is also used for cleaning and etching operations, making steam for oxidation of silicon surfaces, preparing photomasks, and depositing luminescent materials. Other applications are in the development and fabrication of solid-state devices, thin-film devices, communication lasers, light-emitting diodes, photo-detectors, printed circuits, memory devices, vacuum-tube devices, or electrolytic devices. 1.3 Users needing water qualities different from those described here should consult other water standards, such as Specification D1193 and Guide D5196. 1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use. 1.5 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee. |
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| 2. Referenced Documents | ||||||||||||||||||||||||||||||||||||||||
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