Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
NORMA vydaná dňa 18.6.2019
Označenie normy: ISO 21859:2019
Dátum vydania normy: 18.6.2019
Počet strán: 4
Približná hmotnosť: 12 g (0.03 libier)
Krajina: Medzinárodná technická norma
Kategória: Technické normy ISO
Description / Abstract: This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.