ASTM F518-77(1991)E01

Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Banks and Semiconductor Wafers During Etching (Withdrawn 1996)

Anglicky -
Online zabezpečené PDF (72.40 EUR)

Anglicky -

Tlačené (72.40 EUR)

The information about the standard:

Designation standards: ASTM F518-77(1991)E01
Note: NEPLATNÁ
The number of pages: 5
Approximate weight : 15 g (0.03 lbs)
Country: American technical standard
Kategória: Technické normy ASTM