ASTM F1894-98(2011)

Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness (Withdrawn 2020)

NORMA vydaná dňa 1.6.2011

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The information about the standard:

Designation standards: ASTM F1894-98(2011)
Note: NEPLATNÁ
Publication date standards: 1.6.2011
The number of pages: 7
Approximate weight : 21 g (0.05 lbs)
Country: American technical standard
Kategória: Technické normy ASTM

Annotation of standard text ASTM F1894-98(2011) :

Keywords:
analysis of tungsten silicide, backscattering analysis, composition, metallization films, quantitative analysis, RBS, WSix, Backscattering analysis, Composition analysis--semiconductor applications, Density--electronic applications, Metal electronic components/devices, Quantitative analysis/measurement, Rutherford backscattering spectrometry, Tungsten silicide (WSix), ICS Number Code 29.045 (Semiconducting materials)