ASTM F2113-01(2011)

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)

NORMA vydaná dňa 1.6.2011

Anglicky -
PDF - okamžité stiahnutie (60.90 EUR)

Anglicky -

Tlačené (60.90 EUR)

Informácie o norme:

Označenie normy: ASTM F2113-01(2011)
Poznámka: NEPLATNÁ
Dátum vydania normy: 1.6.2011
Počet strán: 2
Približná hmotnosť: 6 g (0.01 libier)
Krajina: Americká technická norma
Kategória: Technické normy ASTM

Anotácia textu normy ASTM F2113-01(2011) :

Keywords:
electronics, purity analysis, purity grade, sputtering, target, thin film, Electronic thin-film applications, High-purity metallic sputtering targets, Impurities--electronic materials/applications, Semiconductor device testing, Sputtering process/targets, Target specifications, Thin film applications, ICS Number Code 29.045 (Semiconducting materials)