ASTM F1894-98(2011)

Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness (Withdrawn 2020)

NORMA vydaná dňa 1.6.2011

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Informácie o norme:

Označenie normy: ASTM F1894-98(2011)
Poznámka: NEPLATNÁ
Dátum vydania normy: 1.6.2011
Počet strán: 7
Približná hmotnosť: 21 g (0.05 libier)
Krajina: Americká technická norma
Kategória: Technické normy ASTM

Anotácia textu normy ASTM F1894-98(2011) :

Keywords:
analysis of tungsten silicide, backscattering analysis, composition, metallization films, quantitative analysis, RBS, WSix, Backscattering analysis, Composition analysis--semiconductor applications, Density--electronic applications, Metal electronic components/devices, Quantitative analysis/measurement, Rutherford backscattering spectrometry, Tungsten silicide (WSix), ICS Number Code 29.045 (Semiconducting materials)